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ICP-OES/ICP-MS Metals Testing

Inductively Coupled Plasma, or ICP, is a high-temperature excitation source that desolvates, vaporizes, and atomizes samples in aerosol form, and then ionizes the resulting atoms. The excited analyte ions and atoms can then subsequently be detected by observing their emission lines (inductively coupled plasma optical emission spectrometry, or ICP-OES), or the excited or ground state ions can be determined using a mass detector (inductively coupled plasma mass spectrometry, or ICP-MS).Both ICP-OES and ICP-MS may be used for either single element or sequential/simultaneous multi-element qualitative or quantitative analysis.

We are currently using a Perkin Elmer Optima 7300DV ICP-OES, a Perkin Elmer NexION 300D ICP-MS, and we have acquired the latest in ICP-MS technology, an Agilent 7900 ICP-MS. With Agilent's 7900 ICP-MS, we are able to routinely measure samples containing up to 25% total dissolved solids (TDS) - 100 times higher than the traditional matrix limit for ICP-MS, and far beyond the capability of any other current system. The Agilent 7900 ICP-MS has a robust plasma and optional Ultra HIgh Matrix Introduction (UHMI) technology and the widest dynamic range. The new orthogonal detector system (ODS) delivers up to 11 orders of magnitude dynamic range from sub-ppt to percent-level concentrations, enabling us to measure trace elements and majors in the same run.

In addition, Robertson Microlit offers the ICP-MS multi-elemental scan, a service which provides a semi-quantitative determination of up to 71 elements in a single sample preparation. We also use our ICP-MS instrumentation for USP <232>/<233> Elemental Impurities . Validation and Method Development services are also available for metals analysis.